Sunday, 4 January 2015

Benefits and risks of FINFET & FD-SOI compared to Bulk transistor.



Benefits and risks of finFETs compared to Bulk transistor.

Strengths
Weaknesses
Significant reduction in power consumption (~50% over 32nm)
Very restrictive design options, especially for analog – Transistor drive strength is quantized to multiples of a single fin width
Faster switching speed
Fin width variability and edge quality leads to variability in threshold voltage VT
Effective speed/power trade-off possible with multi-Vt
Extra manufacturing complexity and expense (~+3% according to Intel)
Availability of strain engineering

Opportunities
Threats
Low power makes 20nm technology deployable for mobile applications
The potentially superior electrical performance and simpler manufacturing of fully depleted SOI
Increase CPU speeds beyond 4GHz


Benefits and risks of FD-SOI compared to Bulk transistor.

Strengths
Weaknesses
Significant reduction in power consumption
High cost of initial wafers (~+10% over regular wafers, according to Intel)
Faster switching speed
Limited number of wafer suppliers
Easier, standard manufacturing process
Variability in VT due to variations in the thickness of silicon thin-film
Availability of back-biasing to control VT
Multi- VT more complex to implement
No doping variability
Lack of strain engineering
Layout library compatible with existing bulktechnologies
Thin channel limits drive strength


Opportunities
Threats
Simpler and more flexible alternative to finFETs if wafer cost issue can be overcome
High wafer cost threatens economic viability for wider market adoption
Better controllability for analog applications




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