GIDL: gate induced drain leakage
is a leakage mechanism from the gate-drain overlap region caused when the Drain
voltage is very high and Gate voltage is very low.The reverse biased pn junction
will undergo band to band tunneling in which the electrons tunnel from the
valence band of the n-type tunnel into the conduction band of the p-type and
the holes tunnel vice-verse. This results in a leakage current through the gate
oxide.
DIBL: Drain induced barrier lowering is related to the reduction in the threshold voltage of the transistor due to the large depletion region created by the Drain potential.U can think of it as-since already a part of the region under the gate is depleted by the drain, only a little amount of gate potential is needed to complete depletion in the rest of the area.This means a lower threshold voltage.
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